Properties of highly conducting ITO films prepared by ion plating

Applied Surface Science

Volumn 33-34, Issue C, 1988, Pages 919-925

  Takaki, S ^a   Matsumoto, K ^a   Suzuki, K ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS--PREPARATION; GLASS--SUBSTRATES; HALL EFFECT; SPUTTERING;

CARRIER DENSITY; INDIUM TIN OXIDE (ITO); ION PLATING; POLYCRYSTALLINE FILMS; RF MAGNETRON SPUTTERING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0024067794     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(88)90399-6     Document Type: Article

References (8)