Electric properties of Ti-Si-N thin cermet films deposited in a triode sputtering system with a hot cathode

Thin Solid Films

Volumn 162, Issue C, 1988, Pages 111-117

  Posadowski, Witold ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

POWDER METAL PRODUCTS; SILICON NITRIDE--ELECTRIC PROPERTIES; SPUTTERING;

CERMET FILMS; REACTIVE SPUTTERING; TEMPERATURE COEFFICIENT OF RESISTANCE;

TITANIUM COMPOUNDS;

EID: 0024055159     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(88)90199-X     Document Type: Article

References (9)

1. Solid State Technol.
2. Compositional Determination of rf Co-Sputtered Multicomponent Systems
3. Structural and electrical properties of granular metal films