RESOLUTION LIMITS FOR ELECTRON-BEAM LITHOGRAPHY.

IBM Journal of Research and Development

Volumn 32, Issue 4, 1988, Pages 502-513

  Broers, A N ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; LITHOGRAPHY;

BEAM DIAMETER; DIRECT SUBLIMATION; ELECTRON BOMBARDMENT; ELECTRON INTERACTION; ELECTRON-BEAM LITHOGRAPHY; RESOLUTION LIMITS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0024048153     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.324.0502     Document Type: Article

References (0)