Applications of in situ SIMS during processing of electronic materials

Surface and Interface Analysis

Volumn 12, Issue 5, 1988, Pages 303-308

  Webb, A P ^a   Smith, J A ^b  

^a SIEMENS AG   (Germany)

^b Gemini Business Park ^*  (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS--PROCESSING; ETCHING; MASS SPECTROMETERS; METALS AND ALLOYS--PROCESSING; SEMICONDUCTOR MATERIALS--PROCESSING;

ELECTRONIC MATERIALS; FINE LINE PATTERNING; MULTILAYER STRUCTURES; QUADRUPOLE MASS SPECTROMETER; SECONDARY ION MASS SPECTROMETRY;

INTEGRATED CIRCUITS, VLSI;

EID: 0024038589     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.740120506     Document Type: Article

References (3)