Ion beam induced roughness and its effect in AES depth profiling of multilayer Ni/Cr thin films

Surface and Interface Analysis

Volumn 12, Issue 2, 1988, Pages 144-150

  Barna, A ^a   Barna, P B ^a   Zalar, A ^b  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b Institut Za Elektroniko in Vakuumsko Techniko ^*

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM AND ALLOYS--THIN FILMS; ION BEAMS; NICKEL AND ALLOYS--THIN FILMS; SPECTROSCOPY, AUGER ELECTRON; SPUTTERING;

AUGER DEPTH PROFILING; ION BEAM ETCHING; ION BEAM INDUCED ROUGHNESS; ION SPUTTER DEPTH PROFILING; MULTILAYER NICKEL/CHROMIUMFILMS;

FILMS;

EID: 0024037767     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.740120215     Document Type: Article

References (13)

1. Characterization of NBS Standard Reference Material 2135 for sputter depth profile analysis