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Volumn 35, Issue 5, 1988, Pages 570-577

A New and Simple Model for GaAs Heterojunction FET Gate Characteristics

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE - DOPING; SEMICONDUCTOR DEVICES, SCHOTTKY BARRIER - HETEROJUNCTIONS; SEMICONDUCTOR DIODES;

EID: 0024013810     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.2499     Document Type: Article
Times cited : (68)

References (14)
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    • Ponse, F.1    Masselink, W.T.2    Morkoç, H.3
  • 5
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  • 7
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    • Electron energy levels in GaAs-Ga 1-x Al x As heterojunctions
    • July
    • F. Stem and S. D. Sarma, “Electron energy levels in GaAs-Ga 1-x Al x As heterojunctions,” Phys. Rev. B, vol. 30, p. 840, July 1984.
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    • Stem, F.1    Sarma, S.D.2
  • 8
    • 84856283666 scopus 로고
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    • Aug.
    • S. Adachi, “GaAs, AlAs and Al x Ga 1-x As material parameters for use in research and device applications,” J. Appl. Phys., vol. 58, no. 3, p. Rl, Aug. 1985.
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  • 9
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    • Feb.
    • A. J. Hill and P. H. Ladbrooke, “Dependence of conduction-band discontinuity on aluminum mole fraction in GaAs/AlGaAs heterojunctions,” Electron. Lett., vol. 22, no. 4, p. 218, Feb. 1986.
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    • New negative resistance region of heterostructure insulated gate transistor (HIGFET) operation
    • M. S. Shur, D. K. Arch, R. R. Daniels, and J. K. Abrokwah, “New negative resistance region of heterostructure insulated gate transistor (HIGFET) operation,” IEEE Electron Device Lett., vol. EDL-7, p. 78, 1986.
    • (1986) IEEE Electron Device Lett. , vol.EDL-7
    • Shur, M.S.1    Arch, D.K.2    Daniels, R.R.3    Abrokwah, J.K.4
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  • 13
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.