SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 11, Issue 8, 1988, Pages 441-446

Effect of analytical method on thickness measurements of thin oxide films

(4) Tapping, R L a Davidson, R D a Jackman, T E b Davies, J A c

a CANADIAN NUCLEAR LABORATORIES (Canada)

b NATIONAL RESEARCH COUNCIL CANADA (Canada)

c MCMASTER UNIVERSITY (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM AND ALLOYS - OXIDATION; FILMS - THICKNESS MEASUREMENT; IRON AND ALLOYS - OXIDATION; NICKEL AND ALLOYS - OXIDATION; SILICON AND ALLOYS - OXIDATION;

AUGER ELECTRON SPECTROSCOPY; ION BEAM SPUTTERING; NUCLEAR REACTION ANALYSIS; TANTALUM OXIDE; ZIRCONIUM OXIDE;

OXIDES;

EID: 0024011802 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.740110806 Document Type: Article

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.