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Japanese Journal of Applied Physics

Volumn 27, Issue 3A, 1988, Pages L287-L289

Highly conducting and transparent SnO2thin films prepared by RF magnetron sputtering on low-temperature substrates

(3) Minami, Tadatsugu a Nanto, Hidehito a Takata, Shinzo a

a KANAZAWA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Low temperature substrate; Rf magnetron sputtering; Sheet resistance; Sn02; Sputtering; Thin film; Transparent conducting film; Transparent electrode

Indexed keywords

ELECTRODES; GLASS - SUBSTRATES; MAGNETIC FIELD EFFECTS; ORGANIC COMPOUNDS - SUBSTRATES; SPUTTERING;

LOW-TEMPERATURE SUBSTRATES; RF MAGNETRON SPUTTERING; TIN DIOXIDE;

SEMICONDUCTING TIN COMPOUNDS;

EID: 0023978519 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.27.L287 Document Type: Article

Times cited : (105)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.