Thin copper films by plasma CVD using copper-hexafluoro-acetylacetonate

Applied Physics A: Solids and Surface

Volumn 45, Issue 2, 1988, Pages 151-154

  Oehr, C ^a   Suhr, H ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON - APPLICATIONS; FILMS - CHEMICAL VAPOR DEPOSITION; HYDROGEN - APPLICATIONS; PLASMAS - APPLICATIONS;

ARGON-HYDROGEN MIXTURES; COPPER-HEXAFLUORO-ACETYLACETONATE; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION;

COPPER AND ALLOYS;

EID: 0023961208     PISSN: 07217250     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/BF02565202     Document Type: Article

References (20)

1. Preparation of Oxide Films by Pyrolysis and Investigation of their Structure Sensitive Properties
2. Vapor Deposition of Metals by Hydrogen Reduction of Metal Chelates
3. Surface processes leading to carbon contamination of photochemically deposited copper films