Electrical Contacts to Beta Silicon Carbide Thin Films

Journal of the Electrochemical Society

Volumn 135, Issue 2, 1988, Pages 359-362

  Edmond, J A ^b   Glass, J T ^b   Davis, R F ^b  

^a NORTHEASTERN UNIVERSITY   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS - MATERIALS; ELECTRIC MEASUREMENTS - RESISTANCE; SEMICONDUCTOR DEVICES - CONTACTS; CHROMIUM AND ALLOYS - APPLICATIONS; ELECTRIC CONTACTS, OHMIC; GOLD TANTALUM ALLOYS - APPLICATIONS; HEAT TREATMENT - ANNEALING; NICKEL AND ALLOYS - APPLICATIONS;

CONTACT RESISTIVITY; OHMIC CONTACTS; SEMICONDUCTING SILICON CARBIDE; SILICON CARBIDE THIN FILMS; DIODE IDEALITY FACTOR; RECTIFYING CONTRACTS;

SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE;

EID: 0023960002     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2095615     Document Type: Article

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