Production of highly charged metal ions and soft X-ray emission in a plasma focus

Japanese Journal of Applied Physics

Volumn 27, Issue 1R, 1988, Pages 89-94

  Hirano, Katsumi ^a   Yamamoto, Toshikazu ^a   Takada, Satoshi ^a   Sone, Hisao ^a   Shimada, Katsuji ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

Crystal spectrograph; Highly charged metal ions; Interferometry; Plasma focus; Soft X rays; Time resolved soft X ray pinhole camera

Indexed keywords

ELECTRON BEAMS; INTERFEROMETRY; METALS AND ALLOYS; PLASMA DEVICES - APPLICATIONS; X-RAY AND GAMM RAY PRODUCTION;

HIGHLY CHARGED METAL IONS; PLASMA FOCUS; X-RAY PINHOLE CAMERA;

IONS;

EID: 0023859413     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.27.89     Document Type: Article

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