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Volumn 38, Issue 6, 1988, Pages 455-457
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Effect of post-deposition vacuum annealing on properties of ITO layers
a
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Author keywords
[No Author keywords available]
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Indexed keywords
HEAT TREATMENT - ANNEALING;
SEMICONDUCTING TIN COMPOUNDS - VACUUM APPLICATIONS;
SPUTTERING - THIN FILMS;
VACUUM TECHNOLOGY - COATINGS;
DEPOSITION TECHNOLOGY;
ITO COATINGS;
LAYER RESISTIVITY;
SEMICONDUCTING INDIUM COMPOUNDS;
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EID: 0023846976
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/0042-207X(88)90587-8 Document Type: Article |
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Times cited : (19)
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References (6)
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