The nature of nitrogen-oxygen complexes in silicon

Japanese Journal of Applied Physics

Volumn 27, Issue 1R, 1988, Pages 62-67

  Suezawa, Masashi ^a   Sumino, Koji ^a   Harada, Hirofumi ^b   Abe, Takao ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Isothermal annealing; N Si; Nitrogen oxygen complex; Shallow donor

Indexed keywords

HEAT TREATMENT - ANNEALING; NITROGEN; OXYGEN; SPECTROSCOPY, ABSORPTION - APPLICATIONS;

ELECTRONIC TRANSITIONS; NITROGEN-OXYGEN COMPLEXES; OPTICAL ABSORPTION SPECTRA; SHALLOW DONORS;

SEMICONDUCTING SILICON;

EID: 0023846461     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.27.62     Document Type: Article

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