New Technique for Measurement of Electrode Strain during Electrochemical Reactions

Journal of the Electrochemical Society

Volumn 135, Issue 1, 1988, Pages 45-51

  Butler, M A ^a   Ginley, D S ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; INTERFEROMETERS - APPLICATIONS; NICKEL AND ALLOYS - ELECTRODEPOSITION; STRAIN - MEASUREMENTS;

COMPRESSIVE STRESS; ELECTROSTRICTION EFFECT; NICKEL LAYER THICKNESS; OPTICAL PATH LENGTH; OXIDE GROWTH;

ELECTRODES;

EID: 0023842286     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2095586     Document Type: Article

References (15)

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7. M. A. Butler and D. S. Ginley, To be published.
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15. Ashok K. Vijk, “Electrochemistry of Metals and Semiconductors,” Chap. 5, Dekker, New York (1973).