A Line Extraction Method for Automated SEM Inspection of VLSI Resist

IEEE Transactions on Pattern Analysis and Machine Intelligence

Volumn 10, Issue 1, 1988, Pages 117-120

  Shu, D B ^a   Li, C C ^b   Mancuso, J F ^b   Sun, Y N ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

^b Westinghouse Research & Development Cent   (United States)

Author keywords

Digital line detection; Hough transform; SEM imaging; VLSI resist; wafer inspection

Indexed keywords

MICROSCOPES, ELECTRON - IMAGING TECHNIQUES; MICROSCOPIC EXAMINATION - SCANNING ELECTRON MICROSCOPY; NONDESTRUCTIVE EXAMINATION - IMAGING TECHNIQUES;

DIGITAL EDGE LINE DETECTION; EDGE CONTOURS EXTRACTION; VLSI RESIST;

INTEGRATED CIRCUITS, VLSI;

EID: 0023834841     PISSN: 01628828     EISSN: None     Source Type: Journal    
DOI: 10.1109/34.3875     Document Type: Article

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