-
1
-
-
0016929430
-
Glass passivation improves high voltage transistors
-
A. H. Berman, “Glass passivation improves high voltage transistors” Solid State Technol., vol. 19, p. 29, 1976.
-
(1976)
, vol.19
, pp. 29
-
-
Berman, A.H.1
-
2
-
-
0019900538
-
Characterization of fused glass passivation with selected diode structures
-
D. L. Flowers and H. G. Hughes, “Characterization of fused glass passivation with selected diode structures,” J. Electrochem. Soc., vol. 129, p. 154, 1982.
-
(1976)
J. Electrochem. Soc.
, vol.19
, pp. 29
-
-
Flowers, D.L.1
Hughes, H.G.2
-
3
-
-
0013285722
-
Some recent developments in fused glass films on semiconductor devices
-
M. Dumesnil and R. Hewitt, “Some recent developments in fused glass films on semiconductor devices,” J. Electrochem. Soc., vol. 117, p. 100, 1970.
-
(1970)
J. Electrochem. Soc.
, vol.117
, pp. 100
-
-
Dumesnil, M.1
Hewitt, R.2
-
4
-
-
0001605225
-
Space charge polarization in glass films
-
E. H. Snow and M. E. Dumesnil, “Space charge polarization in glass films,” J. Appl. Phys., vol. 37, p. 2123, 1966.
-
(1966)
J. Appl. Phys.
, vol.37
, pp. 2123
-
-
Snow, E.H.1
Dumesnil, M.E.2
-
5
-
-
0023168503
-
Surface charge studies on lead borosilicate glass containing trace sodium
-
M. Shimbo, K. Furukawa, K. Tanzawa, and K. Fukuda, “Surface charge studies on lead borosilicate glass containing trace sodium,” J. Electrochem. Soc., vol. 134, p. 156, 1987.
-
(1987)
J. Electrochem. Soc.
, vol.134
, pp. 156
-
-
Shimbo, M.1
Furukawa, K.2
Tanzawa, K.3
Fukuda, K.4
-
6
-
-
0000527118
-
Ion transport phenomena in insulating films
-
[6] E. H. Snow, A. S. Grove, B. E. Deal, and C. T. Sah, “Ion transport phenomena in insulating films,” J. Appl. Phys., vol. 36, p. 1664, 1965.
-
(1965)
J. Appl. Phys.
, vol.36
, pp. 1664
-
-
Snow, E.H.1
Grove, A.S.2
Deal, B.E.3
Sah, C.T.4
-
7
-
-
0017471775
-
Mobile ions in SiO2: potassium
-
G. F. Derbenwick, “Mobile ions in SiO2: potassium,” J. Appl. Phys., vol. 48, p. 1127, 1977.
-
(1977)
J. Appl. Phys.
, vol.48
, pp. 1127
-
-
Derbenwick, G.F.1
-
8
-
-
0016470143
-
Mobile fluoride ions in SiO2
-
R. Williams and H. Hoods, “Mobile fluoride ions in SiO2,” J. Appl. Phys., vol. 46, p. 695, 1975.
-
(1975)
J. Appl. Phys.
, vol.46
, pp. 695
-
-
Williams, R.1
Hoods, H.2
-
9
-
-
84941520491
-
Changes of the electrical properties of the systems PbO-ZnO-B2O3 and PbF2-ZnO-B2O3 during heat-treatment
-
M. Mikoda, T. Hikino, and S. Hayakawa, “Changes of the electrical properties of the systems PbO-ZnO-B 2 O 3 and PbF 2-ZnO-B 2 O 3 during heat-treatment,” J. Ceram. Assoc. Japan, vol. 76, p. 230, 1968.
-
(1968)
J. Ceram. Assoc. Japan
, vol.76
, pp. 230
-
-
Mikoda, M.1
Hikino, T.2
Hayakawa, S.3
-
11
-
-
0008806773
-
Techniques for obtaining uniform thin glass films on substrates
-
W. A. Pliskin and E. E. Conrad, “Techniques for obtaining uniform thin glass films on substrates,” Electrochem. Technol., vol. 2, p. 196, 1964.
-
(1964)
Electrochem. Technol.
, vol.2
, pp. 196
-
-
Pliskin, W.A.1
Conrad, E.E.2
-
12
-
-
0001188528
-
An investigation of surface states at a silicon/silicon oxide interface employing metal-oxide-silicon diodes
-
L. M. Terman, “An investigation of surface states at a silicon/silicon oxide interface employing metal-oxide-silicon diodes,” Solid-State Electron., vol. 5, p. 285, 1962.
-
(1962)
Solid-State Electron.
, vol.5
, pp. 285
-
-
Terman, L.M.1
-
13
-
-
0022488754
-
Glass formation range, acid resistivity and surface charge density of Zno-B2O3-SiO2 passivation glass containing Al2O3
-
M. Shimbo, S. Tai, and K. Tanzawa, “Glass formation range, acid resistivity and surface charge density of Zno-B 2 O 3-SiO2 passivation glass containing Al 2 O 3,” J. Amer. Ceram. Soc., vol. 69, p. 23, 1986.
-
(1986)
J. Amer. Ceram. Soc.
, vol.69
, pp. 23
-
-
Shimbo, M.1
Tai, S.2
Tanzawa, K.3
-
14
-
-
0022122263
-
Investigation of leakage current in a zinc borosilicate glass passivated p-n junction using a gate-controlled diode
-
S. Murakami, Y. Misawa, and N. Momma, “Investigation of leakage current in a zinc borosilicate glass passivated p-n junction using a gate-controlled diode,” J. Electrochem. Soc., vol. 132, p. 2198, 1985.
-
(1985)
J. Electrochem. Soc.
, vol.132
, pp. 2198
-
-
Murakami, S.1
Misawa, Y.2
Momma, N.3
-
15
-
-
0020886859
-
The location evolution, and role of fluorine in glow discharge a Si:F
-
M. Janai, R. Weil, and B. Pratt, “The location evolution, and role of fluorine in glow discharge a Si:F” J. Non-Cryst. Solids, vol. 59 and 60, pp. 743–746, 1983.
-
(1983)
J. Non-Cryst. Solids
, vol.59-60
, pp. 743-746
-
-
Janai, M.1
Weil, R.2
Pratt, B.3
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