Growth and characterization of bi12sio20 films by metalorganic chemical vapor deposition

IEEE Journal of Quantum Electronics

Volumn 23, Issue 12, 1987, Pages 2152-2158

  Nagao, Yasuyuki ^a   Mimura, Yoshinori ^a  

^a Research and Development Laboratories Ko kusai Denshin Denwa Co Ltd ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS - EPITAXIAL GROWTH; ELECTROOPTICAL MATERIALS - CHEMICAL VAPOR DEPOSITION; PHOTOCONDUCTING MATERIALS - CHEMICAL VAPOR DEPOSITION; PHOTOCONDUCTIVITY - MEASUREMENTS;

BISMUTH SILICATE; METALORGANIC CHEMICAL VAPOR DEPOSITION;

BISMUTH COMPOUNDS;

EID: 0023670341     PISSN: 00189197     EISSN: 15581713     Source Type: Journal    
DOI: 10.1109/JQE.1987.1073299     Document Type: Article

References (16)

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