ORGANOSILICON PHOTORESIST FOR USE IN EXCIMER LASER LITHOGRAPHY.

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1987, Pages 929-932

  Orvek, Kevin J ^a   Cunningham Jr , Wells C ^a   McFarland, Janet C ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASERS, EXCIMER; LITHOGRAPHY;

BILAYER RESIST PROCESS; DEEP UV EXCIMER LASER LITHOGRAPHY; NOVOLAK RESISTS; ORGANOSILICON PHOTORESIST;

PHOTORESISTS;

EID: 0023573566     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/iedm.1987.191594     Document Type: Conference Paper

References (5)