ELECTRICAL AND PHYSICAL CHARACTERISTICS OF THIN NITRIDED OXIDES PREPARED BY RAPID THERMAL NITRIDATION.

IEEE Transactions on Electron Devices

Volumn ED-34, Issue 11, 1987, Pages

  Hori, Takashi ^a   Iwasaki, Hiroshi ^a   Naito, Yasushi ^a   Esaki, Hideya ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT - ANNEALING; SEMICONDUCTOR DEVICES, MIS - MATERIALS;

RAPID THERMAL NITRIDATION; THIN NITRIDED OXIDES;

OXIDES;

EID: 0023453863     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (23)