Low Pressure Deposition of Doped SiO2 by Pyrolysis of Tetraethylorthosilicate (TEOS) I. Boron and Phosphorus Doped Films

Journal of the Electrochemical Society

Volumn 134, Issue 11, 1987, Pages 2923-2931

  Becker, F S ^a   Rohl S ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS - PYROLYSIS; SILICATES - PYROLYSIS;

POLYSILICON; TETRAETHYLORTHOSILICATE (TEOS); TRENCH FILLING; TRIMETHYLBORATE;

SILICA;

EID: 0023451349     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2100314     Document Type: Article

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