Refractive Index Dispersion of Dielectric Films Used in the Semiconductor Industry

Journal of the Electrochemical Society

Volumn 134, Issue 11, 1987, Pages 2819-2826

  Pliskin, W A ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS - THIN FILMS; OPTICAL VARIABLES MEASUREMENT; SEMICONDUCTOR DEVICES - MATERIALS;

CAUCHY RELATION; E-BEAM RESISTS; OXYNITRIDE; REFRACTIVE INDEX DISPERSION;

FILMS;

EID: 0023451347     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2100295     Document Type: Article

References (12)

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5. W. A. Pliskin, Abstract 32, p. 91, The Electrochemical Society Extended Abstracts, San Francisco, CA, May, 12–17, 1974.
6. I. H. Malitson, J. Opt. Soc. Am., 55, 1205 (1965).
7. W. A. Pliskin, in “Physical Measurement and Analysis of Thin Films, ” E. M. Murt and W. G. Guldner, Editors, Chap. I, p. 1, Plenum Publishing Corp., New York (1969).
8. R. A. Wesson, R. P. Phillips, and W. A. Pliskin, J. Appl. Phys., 38, 2455 (1967).
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10. W. A. Pliskin and S. J. Zanin, in “Handbook of Thin Film Technology, ” L. I. Maissel and R. Glang, Editors, Chap. 11, McGraw-Hill, New York (1970).
11. W. A. Pliskin and E. E. Conrad, IBM J. Res. Dev., 8, 43 (1964).
12. W. A. Pliskin, IBM Technical Disclosure Bull., 20, 1775 (1977).