High Temperature microhardness of hard coatings produced by physical and chemical vapor deposition

Thin Solid Films

Volumn 153, Issue 1-3, 1987, Pages 19-36

  Quinto, Dennis T ^a   Wolfe, George J ^a   Jindal, Prem C ^a  

^a KENNAMETAL INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPIC EXAMINATION - TRANSMISSION ELECTRON MICROSCOPY; TITANIUM COMPOUNDS - CHEMICAL VAPOR DEPOSITION;

MICROHARDNESS; PHYSICAL VAPOR DEPOSITION;

COATING TECHNIQUES;

EID: 0023439871     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(87)90166-0     Document Type: Article

References (18)

1. Proc. 11th Plansee Seminar
2. Titanium aluminum nitride films: A new alternative to TiN coatings
3. States of residual stress both in films and in their substrates
4. Higher nitrides of hafnium, zirconium, and titanium synthesized by dual ion beam deposition