Chemically vapor deposited Ti3SiC2

Materials Research Bulletin

Volumn 22, Issue 9, 1987, Pages 1195-1201

  Goto, T ^a   Hirai, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS - CHEMICAL VAPOR DEPOSITION;

DENSITY; LATTICE PARAMETERS; MICROHARDNESS; SOFT CERAMICS; TITANIUM SILICON CARBIDE;

TITANIUM COMPOUNDS;

EID: 0023421868     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/0025-5408(87)90128-0     Document Type: Article

References (7)