GROWTH OF DIAMOND USING PLASMA CHEMICAL VAPOR DEPOSITION.

KOBELCO Technology Review

Volumn , Issue 2, 1987, Pages 49-52

  Nishimura, Kozo ^a   Kobashi, Koji ^a   Kawate, Yoshio ^a   Horiuchi, Takefumi ^a  

^a KOBE STEEL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - GROWING;

DIAMOND THIN FILMS; MICROWAVE CVD METHOD;

DIAMONDS;

EID: 0023396787     PISSN: 09134794     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)