-
1
-
-
6044234792
-
Design of micron switching devices
-
Dec
-
R. H. Dennard, F. H. Gaensslen, L. Kuhn, and H. N. Yu, “Design of micron switching devices,” in IEDM Tech. Dig., p. 168, Dec. 1972.
-
(1972)
IEDM Tech. Dig.
, pp. 168
-
-
Dennard, R.H.1
Gaensslen, F.H.2
Kuhn, L.3
Yu, H.N.4
-
2
-
-
0016116644
-
Design of ion-implanted MOSFET’s with very small physical dimensions
-
Oct
-
R. H. Dennard, F. H. Gaensslen, H. N. Yu, V. L. Rideout, E. Bassous, and A. R. LeBlanc, “Design of ion-implanted MOSFET’s with very small physical dimensions,” IEEE J. Solid-State Circuits, vol. SC-9, no. 5, pp. 256–268, Oct. 1974.
-
(1974)
IEEE J. Solid-State Circuits
, vol.SC-9
, Issue.5
, pp. 256-268
-
-
Dennard, R.H.1
Gaensslen, F.H.2
Yu, H.N.3
Rideout, V.L.4
Bassous, E.5
LeBlanc, A.R.6
-
3
-
-
0019596416
-
Finite-element analysis of semiconductor devices: The FIELDAY program
-
July
-
E. M. Buturla, P. E. Cottrell, B. M. Grossman, and K. A. Salsburg, “Finite-element analysis of semiconductor devices: The FIELDAY program,” IBM J. Res. Develop., vol. 25, no. 4, pp. 218–231, July 1981.
-
(1981)
IBM J. Res. Develop.
, vol.25
, Issue.4
, pp. 218-231
-
-
Buturla, E.M.1
Cottrell, P.E.2
Grossman, B.M.3
Salsburg, K.A.4
-
4
-
-
84916404354
-
A general control-volume formulation for modeling impact ionization in semiconductor transport
-
Oct
-
S. E. Laux and B. M. Grossman, “A general control-volume formulation for modeling impact ionization in semiconductor transport,” IEEE Trans. Electron Devices, vol. ED-32, no. 10, pp. 2076–2082, Oct. 1985.
-
(1985)
IEEE Trans. Electron Devices
, vol.ED-32
, Issue.10
, pp. 2076-2082
-
-
Laux, S.E.1
Grossman, B.M.2
-
5
-
-
0020098857
-
A two-dimensional model of the avalanche effect in MOS transistors
-
Mar
-
A. Schütz, S. Selberherr, and H. W. Pötzl, “A two-dimensional model of the avalanche effect in MOS transistors,” Solid-State Electron., vol. 25, no. 3, pp. 177–183, Mar. 1982.
-
(1982)
Solid-State, Electron.
, vol.25
, Issue.3
, pp. 177-183
-
-
Schütz, A.1
Selberherr, S.2
Pötzl, H.W.3
-
6
-
-
0020113843
-
Analysis of breakdown phenomena in MOSFET's
-
Apr
-
R. H. Dennard, F. H. Gaensslen, “Analysis of breakdown phenomena in MOSFET’s,” IEEE Trans. Computer-Aided Design of ICAS, vol. CAD-1, no. 2, pp. 77–85, Apr. 1982.
-
(1982)
IEEE Trans. Computer-Aided Design of ICAS
, vol.CAD-1
, Issue.2
, pp. 77-85
-
-
Dennard, R.H.1
Gaensslen, F.H.2
-
7
-
-
0015745021
-
Source-drain breakdown in an insulated gate field-effect transistor
-
Dec
-
D. P. Kennedy and A. Phillips, Jr., “Source-drain breakdown in an insulated gate field-effect transistor,” in IEDM Tech. Dig., p. 160, Dec. 1973.
-
(1973)
IEDM Tech. Dig.
, pp. 160
-
-
Kennedy, D.P.1
Phillips, A.2
-
8
-
-
0017996560
-
A numerical model of avalanche breakdown in MOSFET?s
-
July
-
T. Toyabe, K. Yamaguchi, S. Asai, and M. S. Mock, “A numerical model of avalanche breakdown in MOSFET's,” IEEE Trans. Electron Devices, vol. ED-25, no. 7, p. 825–832, July 1978.
-
(1978)
IEEE Trans. Electron Devices
, vol.ED-25
, Issue.7
, pp. 825-832
-
-
Toyabe, T.1
Yamaguchi, K.2
Asai, S.3
Mock, M.S.4
-
9
-
-
0020205140
-
An analytical breakdown model for short-channel MOSFET's
-
Nov
-
F.-C. Hsu, P.-K. Ko, S. Tam, C. Hu, and R. S. Muller, “An analytical breakdown model for short-channel MOSFET’s,” IEEE Trans. Electron Devices, vol. ED-29, no. 11, pp. 1735–1740, Nov. 1982.
-
(1982)
IEEE Trans. Electron Devices
, vol.ED-29
, Issue.11
, pp. 1735-1740
-
-
Hsu, F.-C.1
Ko, P.-K.2
Tam, S.3
Hu, C.4
Muller, R.S.5
-
10
-
-
0009667182
-
Temperature dependence of avalanche multiplication in semiconductors
-
Sept. 15
-
C. R. Crowell and S. M. Sze, “Temperature dependence of avalanche multiplication in semiconductors,” Appl. Phys. Lett., vol. 9, no. 6, pp. 242–244, Sept. 15, 1966.
-
(1966)
Appl. Phys. Lett.
, vol.9
, Issue.6
, pp. 242-244
-
-
Crowell, C.R.1
Sze, S.M.2
-
11
-
-
0020831950
-
Transconductance degradation in thin-oxide MOSFET's
-
Oct
-
G. Baccarani and M. W. Wordeman, “Transconductance degradation in thin-oxide MOSFET’s,” IEEE Trans. Electron Devices, vol. ED-30, no. 10, pp. 1295–1304, Oct. 1983.
-
(1983)
IEEE Trans. Electron Devices
, vol.ED-30
, Issue.10
, pp. 1295-1304
-
-
Baccarani, G.1
Wordeman, M.W.2
-
12
-
-
0346427642
-
An impact ionization model for two-dimensional device simulation
-
Feb
-
T. Thurgate and N. Chan, “An impact ionization model for two-dimensional device simulation,” IEEE Trans. Electron Devices, vol. ED-32, no. 2, pp. 400–404, Feb. 1985.
-
(1985)
IEEE Trans. Electron Devices
, vol.ED-32
, Issue.2
, pp. 400-404
-
-
Thurgate, T.1
Chan, N.2
-
13
-
-
0022079956
-
A novel impact-ionization model for l-μm-MOSFET simulation
-
June
-
R. Kuhnert, C. Werner, and A. Schütz, “A novel impact-ionization model for l-μm-MOSFET simulation,” IEEE Trans. Electron Devices, vol. ED-32, no. 6, pp. 1057–1063, June 1985.
-
(1985)
IEEE Trans. Electron Devices
, vol.ED-32
, Issue.6
, pp. 1057-1063
-
-
Kuhnert, R.1
Werner, C.2
Schütz, A.3
-
14
-
-
84939721840
-
Nonuniform displacement of MOSFET channel pinchoff
-
Feb
-
S. G. Chamberlain, A. Husain, and F. H. Gaensslen, “Nonuniform displacement of MOSFET channel pinchoff,” IEEE Trans. Electron Devices, vol. ED-31, no. 2, pp. 252–256, Feb. 1984.
-
(1984)
IEEE Trans. Electron Devices
, vol.ED-31
, Issue.2
, pp. 252-256
-
-
Chamberlain, S.G.1
Husain, A.2
Gaensslen, F.H.3
|