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Volumn 34, Issue 5, 1987, Pages 1066-1073

A study of channel avalanche breakdown in scaled n-mosfet’s

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN - MATHEMATICAL MODELS;

EID: 0023346895     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1987.23046     Document Type: Article
Times cited : (17)

References (14)
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  • 4
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    • S. E. Laux and B. M. Grossman, “A general control-volume formulation for modeling impact ionization in semiconductor transport,” IEEE Trans. Electron Devices, vol. ED-32, no. 10, pp. 2076–2082, Oct. 1985.
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  • 5
    • 0020098857 scopus 로고
    • A two-dimensional model of the avalanche effect in MOS transistors
    • Mar
    • A. Schütz, S. Selberherr, and H. W. Pötzl, “A two-dimensional model of the avalanche effect in MOS transistors,” Solid-State Electron., vol. 25, no. 3, pp. 177–183, Mar. 1982.
    • (1982) Solid-State, Electron. , vol.25 , Issue.3 , pp. 177-183
    • Schütz, A.1    Selberherr, S.2    Pötzl, H.W.3
  • 7
    • 0015745021 scopus 로고
    • Source-drain breakdown in an insulated gate field-effect transistor
    • Dec
    • D. P. Kennedy and A. Phillips, Jr., “Source-drain breakdown in an insulated gate field-effect transistor,” in IEDM Tech. Dig., p. 160, Dec. 1973.
    • (1973) IEDM Tech. Dig. , pp. 160
    • Kennedy, D.P.1    Phillips, A.2
  • 8
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    • A numerical model of avalanche breakdown in MOSFET?s
    • July
    • T. Toyabe, K. Yamaguchi, S. Asai, and M. S. Mock, “A numerical model of avalanche breakdown in MOSFET's,” IEEE Trans. Electron Devices, vol. ED-25, no. 7, p. 825–832, July 1978.
    • (1978) IEEE Trans. Electron Devices , vol.ED-25 , Issue.7 , pp. 825-832
    • Toyabe, T.1    Yamaguchi, K.2    Asai, S.3    Mock, M.S.4
  • 9
    • 0020205140 scopus 로고
    • An analytical breakdown model for short-channel MOSFET's
    • Nov
    • F.-C. Hsu, P.-K. Ko, S. Tam, C. Hu, and R. S. Muller, “An analytical breakdown model for short-channel MOSFET’s,” IEEE Trans. Electron Devices, vol. ED-29, no. 11, pp. 1735–1740, Nov. 1982.
    • (1982) IEEE Trans. Electron Devices , vol.ED-29 , Issue.11 , pp. 1735-1740
    • Hsu, F.-C.1    Ko, P.-K.2    Tam, S.3    Hu, C.4    Muller, R.S.5
  • 10
    • 0009667182 scopus 로고
    • Temperature dependence of avalanche multiplication in semiconductors
    • Sept. 15
    • C. R. Crowell and S. M. Sze, “Temperature dependence of avalanche multiplication in semiconductors,” Appl. Phys. Lett., vol. 9, no. 6, pp. 242–244, Sept. 15, 1966.
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    • Crowell, C.R.1    Sze, S.M.2
  • 11
    • 0020831950 scopus 로고
    • Transconductance degradation in thin-oxide MOSFET's
    • Oct
    • G. Baccarani and M. W. Wordeman, “Transconductance degradation in thin-oxide MOSFET’s,” IEEE Trans. Electron Devices, vol. ED-30, no. 10, pp. 1295–1304, Oct. 1983.
    • (1983) IEEE Trans. Electron Devices , vol.ED-30 , Issue.10 , pp. 1295-1304
    • Baccarani, G.1    Wordeman, M.W.2
  • 12
    • 0346427642 scopus 로고
    • An impact ionization model for two-dimensional device simulation
    • Feb
    • T. Thurgate and N. Chan, “An impact ionization model for two-dimensional device simulation,” IEEE Trans. Electron Devices, vol. ED-32, no. 2, pp. 400–404, Feb. 1985.
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    • Thurgate, T.1    Chan, N.2
  • 13
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    • A novel impact-ionization model for l-μm-MOSFET simulation
    • June
    • R. Kuhnert, C. Werner, and A. Schütz, “A novel impact-ionization model for l-μm-MOSFET simulation,” IEEE Trans. Electron Devices, vol. ED-32, no. 6, pp. 1057–1063, June 1985.
    • (1985) IEEE Trans. Electron Devices , vol.ED-32 , Issue.6 , pp. 1057-1063
    • Kuhnert, R.1    Werner, C.2    Schütz, A.3
  • 14
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    • Nonuniform displacement of MOSFET channel pinchoff
    • Feb
    • S. G. Chamberlain, A. Husain, and F. H. Gaensslen, “Nonuniform displacement of MOSFET channel pinchoff,” IEEE Trans. Electron Devices, vol. ED-31, no. 2, pp. 252–256, Feb. 1984.
    • (1984) IEEE Trans. Electron Devices , vol.ED-31 , Issue.2 , pp. 252-256
    • Chamberlain, S.G.1    Husain, A.2    Gaensslen, F.H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.