Characterization of a Self-Aligned Cobalt silicide Process

Journal of the Electrochemical Society

Volumn 134, Issue 4, 1987, Pages 925-935

  Morgan, A E ^a   Broadbent, E K ^a   Delfino, M ^a   Coulman, B ^a   Sadana, D K ^a  

^a Philips Signetics Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS - MATERIALS; FILMS - METALLIC; INTEGRATED CIRCUITS - MATERIALS; SEMICONDUCTOR DEVICES, MOS - MATERIALS;

OXIDE SIDEWALL SPACERS; SELF-ALIGNED COBALT SILICIDE PROCESS; SILICIDATION ANNEAL; TITANIUM SILICIDE;

COBALT COMPOUNDS;

EID: 0023329252     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2100597     Document Type: Article

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