Time Resolved Annealing of Interface Traps in Polysilicon Gate Metal-Oxide-Silicon Capacitors

Journal of the Electrochemical Society

Volumn 134, Issue 3, 1987, Pages 674-681

  Fishbein, Bruce J ^a   Watt, Jeffrey T ^a   Plummer, James D ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS - PROCESSING; HEAT TREATMENT - ANNEALING; SEMICONDUCTING SILICON - APPLICATIONS;

INTERFACE TRAPS; POLYSILICON GATE METAL-OXIDE-SILICON CAPACITORS; RAPID THERMAL PROCESSING; TIME RESOLVED ANNEALING;

SEMICONDUCTOR DEVICES, MOS;

EID: 0023312178     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2100530     Document Type: Article

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