Dielectric Characteristics of Double Layer Structure of Extremely Thin Ta2O5/SiO2on Si

Journal of the Electrochemical Society

Volumn 134, Issue 2, 1987, Pages 410-415

  Nishioka, Yasushiro ^a   Kimura, Shin'ichiro ^a   Shinriki, Hiroshi ^a   Mukai, Kiichiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS - THIN FILMS; SEMICONDUCTING SILICON - SUBSTRATES; SILICA - THIN FILMS;

FOWLER-NORDHEIM CONDUCTION; LEAKAGE CURRENT FLOWS; TANTALUM PENTOXIDE;

TANTALUM COMPOUNDS;

EID: 0023293799     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2100469     Document Type: Article

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