NEW VLSI DIAGNOSIS TECHNIQUE: FOCUSED ION BEAM ASSISTED MULTI-LEVEL CIRCUIT PROBING.

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1987, Pages 111-117

  Mashiko, Y ^a   Morimoto, H ^a   Koyama, H ^a   Kawazu, S ^a   Kaito, T ^a   Adachi, T ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - CHEMICAL VAPOR DEPOSITION; ION BEAMS; TRANSISTORS;

FOCUSED ION BEAM; MULTI-LEVEL CIRCUIT PROBING;

INTEGRATED CIRCUITS, VLSI;

EID: 0023210098     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)