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Volumn 34, Issue 1, 1987, Pages 89-93

A Semi-Empirical Model of the MOSFET Inversion Layer Mobility for Low-Temperature Operation

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENICS - LOW TEMPERATURE PHENOMENA;

EID: 0023090016     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1987.22889     Document Type: Article
Times cited : (122)

References (15)
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  • 2
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    • Characterization of electron mobility in the inverted < 100> silicon surface
    • A. G, Sabnis and J. T. Clemens, “Characterization of electron mobility in the inverted < 100> silicon surface,” in 1EDM Tech. Dig., p. 18, 1979.
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    • Sabnis, A.G.1    Clemens, J.T.2
  • 3
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    • S. C. Sun and J. D. Plummer, “Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces,” IEEE Trans. Electron Devices, vol. ED-29, pp. 1497-1508, 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-29 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 4
    • 0020918485 scopus 로고
    • Semi-empirical equations for electron velocity in silicon:Part II—MOS inversion layer
    • S. A. Schwarz and S. E. Russek, “Semi-empirical equations for electron velocity in silicon:Part II—MOS inversion layer,” IEEE Trans. Electron Devices, vol. ED-29, pp. 1634-1639, 1983.
    • (1983) IEEE Trans. Electron Devices , vol.ED-29 , pp. 1634-1639
    • Schwarz, S.A.1    Russek, S.E.2
  • 5
    • 0022025576 scopus 로고
    • The classical versus the quantum mechanical model of mobility degradation due to the gate field in MOSFET inversion layers
    • M. S. Lin, “The classical versus the quantum mechanical model of mobility degradation due to the gate field in MOSFET inversion layers,” IEEE Trans. Electron Devices, vol. ED-29, pp. 700-710, 1985.
    • (1985) IEEE Trans. Electron Devices , vol.ED-29 , pp. 700-710
    • Lin, M.S.1
  • 10
    • 0018457220 scopus 로고
    • Temperature dependent threshold voltage behavior of depletion mode MOSFET's
    • F, H. Gaensslen and R. C. Jaeger, “Temperature dependent threshold voltage behavior of depletion mode MOSFET's,” Solid-State Electron., vol. 22, pp. 423-430, 1979.
    • (1979) Solid-State Electron. , vol.22 , pp. 423-430
    • Gaensslen, F.H.1    Jaeger, R.C.2
  • 11
    • 0019018746 scopus 로고
    • Simulation of impurity freezeout through numerical solution of Poisson's equation with application to MOS device behavior
    • R. C. Jaeger and F. H. Gaensslen, “Simulation of impurity freezeout through numerical solution of Poisson's equation with application to MOS device behavior,” IEEE Trans. Electron Devices, vol. ED-27, pp. 914-920, 1980
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 914-920
    • Jaeger, R.C.1    Gaensslen, F.H.2
  • 12
    • 0022685879 scopus 로고
    • Temperature dependence of specific contact resistivity
    • S. E. Swirhun and R. M. Swanson, “Temperature dependence of specific contact resistivity,” IEEE Electron Device Lett., vol. EDL-7, pp. 155-157, 1986.
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  • 13
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    • Semi-empirical model for the threshold voltage of a double implanted MOSFET and its temperature dependence
    • to be published.
    • N. D. Arora, “Semi-empirical model for the threshold voltage of a double implanted MOSFET and its temperature dependence,” Solid-State Electron., to be published.
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  • 14
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    • Electron and hole mobilities in silicon as a function of concentration and temperature
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  • 15
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    • Temperature dependence of scattering in the inversion layer
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.