PERFORMANCE AND RELIABILITY OF THIN GATE DIELECTRICS FOR VLSI: MATERIALS AND PROCESSING PROSPECTIVE.

Materials Research Society Symposia Proceedings

Volumn 71, Issue , 1986, Pages 519-524

  Singh, R ^a  

^a UNIVERSITY OF OKLAHOMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES - FABRICATION; SEMICONDUCTOR DEVICES, MOSFET - RELIABILITY;

DYNAMIC RANDOM ACCESS MEMORY (DRAM); THIN GATE DIELECTRICS; ULTRA LARGE SCALE INTEGRATION (ULSI);

INTEGRATED CIRCUITS, VLSI;

EID: 0022986540     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)