ELECTRICAL PROPERTIES OF THIN Ta//2O//5 FILMS GROWN BY CHEMICAL VAPOR DEPOSITION.

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1986, Pages 680-683

  Saitoh, M ^a   Mori, T ^a   Tamura, H ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDES - CHEMICAL VAPOR DEPOSITION;

DIELECTRIC FILMS; TANTALUM PENTOXIDE;

TANTALUM COMPOUNDS;

EID: 0022983336     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)