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Volumn , Issue , 1986, Pages 200-207
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BREAKDOWN MECHANISMS IN MOS CAPACITORS FOLLOWING ELECTRICAL OVERSTRESS.
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC BREAKDOWN;
SEMICONDUCTOR DEVICES, MOS;
BREAKDOWN SITES;
DAMAGE SITES;
ELECTRICAL OVERSTRESS;
INJECTED PULSE WIDTH;
MOS CAPACITORS;
N-TYPE WAFERS;
CAPACITORS;
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EID: 0022955354
PISSN: 07395159
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (5)
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References (8)
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