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Plasma Chemistry and Plasma Processing

Volumn 6, Issue 4, 1986, Pages 349-380

Mechanism of etching and of surface modification of polyimide in RF and LF SF6-O2 discharges

(2) Kogoma, M a Turban, G a

a UNIVERSITÉ DE NANTES (France)

Author keywords

O2; plasma etching; Polyimide; SF6; surface modification

Indexed keywords

ETCHING; PLASMAS - APPLICATIONS; SURFACES - PROCESSING;

ION FLUX; NEUTRAL MOLECULES; SURFACE MODIFICATION;

POLYIMIDES;

EID: 0022905846 PISSN: 02724324 EISSN: 15728986 Source Type: Journal
DOI: 10.1007/BF00565550 Document Type: Article

Times cited : (42)

References (26)

1
- 0020848299
- (1983) J. Electrochem. Soc. , vol.130 , pp. 2231
- Turban, G.¹ Rapeaux, M.²

2
- 84933989205
- F. Egitto, V. Vukanovic, R. Horwath, and F. Emmi, in Proc. 7th Int. Symp. Plasma Chemistry, C. J. Timmermand, ed., Eindhoven, The Netherlands (1985), Vol. 3, p. 983.

3
- 84933989202
- K. Takahashi, H. Kasai, M. Kogoma, T. Moriwaki, and S. Okazaki, in Proc. 9th Symp. on ISIAT 85, Tokyo, Japan, p. 413.

4
- 84933989203
- A. Picard, Thèse de 3e Cycle, Université de Nantes, France, 14 Nov. 1984, unpublished.

5
- 84933989200
- H. H. Sawin, B. E. Thompson, and A. D. Richards, in 166th Meeting Electrochem. Soc., New-Orleans, USA, Oct. 1984, abstract No. 401.

6
- 0018542585
- (1979) J. Appl. Polym. Sci , vol.24 , pp. 1957
- Hirotsu, T.¹

7
- 0019543794
- (1981) Polymer , vol.22 , pp. 361
- Anaud, M.¹ Cohen, R.E.² Baddour, R.F.³

8
- 84933945955
- (1974) J. Polym. Sci. Polym. Chem. Ed. , vol.12 , pp. 1049
- Yasuda, H.¹ Marsch, H.C.² Brandt, S.³ Reilly, C.N.⁴

9
- 84933989201
- A. Picard, G. Turban, and B. Grolleau, J. Phys. D. Appl. Phys. 1986, in press.

10
- 0001505562
- Time-resolved optical diagnostics of radio frequency plasmas
- (1985) Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , vol.3 A , pp. 617
- Gottscho, R.A.¹ Mandich, M.L.²

11
- 0003899196
- Springer-Verlag, Berlin
- (1980) Topics in Current Chemistry, No. 94, Plasma Chemistry III , pp. 1
- Kay, E.¹ Coburn, J.W.² Dilks, A.³

12
- 84933989198
- A. Dilks and E Kay, Plasma Polymerization, ACS Series, No. 108, Washington DC (1979), p. 195.

13
- 84933989199
- D. T. Clark, CRC Critical Review in Solid State and Materials Sciences, 1978, p. 1.

14
- 84933989186
- T. Wydeven, C. C. Johnson, M. A. Golub, M. S. Hsu, and N. R. Lerner, Plasma Polymerization, ACS series, No. 108, Washington DC (1979), p. 299.

15
- 84910811054
- (1972) Am. Lab. , vol.4 , pp. 65
- Riggs, W.M.¹ Fedchenko, R.P.²

16
- 84933989190
- Handbook of X Ray Photoelectron Spectroscopy, Perkin-Elmer.

17
- 84933989188
- S. V. Babu and L. A. Tiemann, in Proc. 7th Int. Symp. Plasma Chemistry, C. J. Timmermans, ed. Eindhoven, The Netherlands (1985), Vol. 3, p. 1025.

18
- 84933989181
- R. J. Lagow, J. L. Adcock, and S. Inone, US Patent No. 4,144,374.

19
- 33947092714
- (1978) J. Am. Chem. Soc. , vol.100 , pp. 1948
- Adcock, J.L.¹ Inone, S.² Lagow, R.J.³

20
- 84933981869
- (1965) Bull. Chem. Soc. Jpn. , vol.38 , pp. 835
- Nagase, S.¹ Tanaka, K.² Baba, H.³

21
- 33845377373
- (1985) Macromolecules , vol.18 , pp. 98
- Corbin, G.¹ Cohen, R.E.² Baddour, R.F.³

22
- 0037862197
- (1966) Chem. Rev. , vol.66 , pp. 465
- Kerr, J.A.¹

23
- 0020702719
- Basic phenomena in reactive low pressure plasmas used for deposition and etching-current status
- (1984) Pure and Applied Chemistry , vol.56 , pp. 215
- Turban, G.¹

24
- 0004165225
- McGraw-Hill, New York
- (1965) Chemical Kinetics , pp. 256
- Laidler, K.J.¹

25
- 0021197288
- (1984) J. Appl. Phys. , vol.55 , pp. 242
- Donnelly, V.M.¹ Flamm, D.L.² Dautremont-Smith, W.C.³ Werder, D.J.⁴

26
- 0020114151
- (1982) J. Appl. Phys. , vol.53 , pp. 3214
- Miyake, K.¹ Tachi, S.² Yagi, K.³ Tokuyama, T.⁴

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