0. 5 MICRON GATE CMOS TECHNOLOGY USING E-BEAM/OPTICAL MIX LITHOGRAPHY.

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1986, Pages 13-14

  Wang, L K ^a   Taur, Y ^a   Moy, D ^a   Dennard, R H ^a   Chiong, K ^a   Hohn, F ^a   Coane, P J ^a   Edenfeld, A ^a   Carbaugh, S ^a   Kenney, D ^a   Schnur, S ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS - APPLICATIONS; LITHOGRAPHY; SEMICONDUCTOR DEVICES, FIELD EFFECT; SEMICONDUCTOR DEVICES, MOS;

CMOS TECHNOLOGY; ELECTRON BEAM/OPTICAL MIX LITHOGRAPHY;

INTEGRATED CIRCUITS, VLSI;

EID: 0022888381     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)