HYDROGEN, CARBON AND OXYGEN ANALYSIS IN THIN FILMS USING EXTREMELY HIGH VACUUM SIMS.

Conference on Solid State Devices and Materials

Volumn , Issue , 1986, Pages 403-406

  Homma, Yoshikazu ^a   Maruo, Tetsuya ^a   Ishii, Yoshikazu ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; HYDROGEN; OXYGEN;

DETECTION LIMITS; HIGH VACUUM; K-CRYOPANEL; RESIDUAL GASES; SECONDARY ION MASS SPECTROMETRY; SIMS;

MASS SPECTROMETERS;

EID: 0022876929     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)