Silicon High-Resistivity-Substrate Millimeter-Wave Technology

IEEE Transactions on Electron Devices

Volumn 33, Issue 12, 1986, Pages 2047-2052

  Buechler, Josef ^a   Kasper, Erich ^b   Russer, Peter ^a   Strohm, Karl M ^b  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b AEG   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; INTEGRATED CIRCUITS, MONOLITHIC - MILLIMETER WAVES; MICROSTRIP DEVICES - PROCESSING; OSCILLATORS; SEMICONDUCTOR DIODES, IMPATT;

COMBINED MONOLITHIC-HYBRID INTEGRATION; LINEAR MICROSTRIP RESONATORS; MOLECULAR BEAM EPITAXY (MBE); SILICON HIGH-RESISTIVITY SUBSTRATES; X-RAY LITHOGRAPHY;

SEMICONDUCTING SILICON;

EID: 0022863613     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1986.22866     Document Type: Article

References (10)

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