Electrical characteristics and growth kinetics in discharges used for plasma deposition of amorphous carbon

Thin Solid Films

Volumn 144, Issue 2, 1986, Pages 265-280

  Catherine, Y ^a   Couderc, P ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS - GROWING; FILMS - ELECTRIC PROPERTIES; PLASMAS;

CURRENT DENSITY; GROWTH KINETICS; HYDROGENATED CARBON; ION BOMBARDMENT; PLASMA DEPOSITION;

CARBON;

EID: 0022810595     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(86)90419-0     Document Type: Article

References (33)

1. Electron spectroscopy of ion beam and hydrocarbon plasma generated diamondlike carbon films
2. Application of RF Discharges to Sputtering
3. Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system
4. Electrical characterization of rf glow discharges using an operating impedance bridge
5. The measurement of Penning ionization cross sections for helium 23S metastables using a steady-state flowing afterglow method
6. Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar system
7. Proc. 4ème Coll. Int. Plasma et Pulvérisation cathodique
8. Modeling of Low-Pressure CVD Processes