Thermal SiO2 Films on n+ Polycrystalline Silicon: Electrical Conduction and Breakdown

IEEE Transactions on Electron Devices

Volumn 33, Issue 11, 1986, Pages 1785-1794

  Faraone, Lorenzo ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON AND ALLOYS - OXIDATION; SOLIDS - ELECTRIC BREAKDOWN;

SILICON DIOXIDE; THERMAL OXIDATION;

SILICA;

EID: 0022806033     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1986.22741     Document Type: Article

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