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Volumn 24, Issue 5, 1986, Pages 955-964
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Chain scission efficiency and reactive‐ion etch resistance of alternating copolymers of styrene and olefins trisubstituted or tetrasubstituted with electron‐withdrawing groups
a a,c b b |
Author keywords
[No Author keywords available]
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Indexed keywords
POLYMETHYL METHACRYLATE;
POLYOLEFINS;
POLYSTYRENES;
CHAIN SCISSION;
ETCH RESISTANCE;
GAMMA RADIOLYSIS;
LITHOGRAPHIC STUDIES;
COPOLYMERS;
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EID: 0022723458
PISSN: 0887624X
EISSN: 10990518
Source Type: Journal
DOI: 10.1002/pola.1986.080240513 Document Type: Article |
Times cited : (13)
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References (43)
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