Study of argon and silicon implantation damage in polycrystalline silicon

Journal of the Electrochemical Society

Volumn 133, Issue 5, 1986, Pages 993-995

  Huang, J ^a   Jaccodine, R J ^a  

^a LEHIGH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; RADIATION DAMAGE; SILICON AND ALLOYS - APPLICATIONS;

ASHBY-BROWN CONTRAST; POLYCRYSTALLINE SILICON; SILICON IMPLANTATION DAMAGE;

SEMICONDUCTING SILICON;

EID: 0022713863     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2108784     Document Type: Article

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