Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges

IEEE Transactions on Plasma Science

Volumn 14, Issue 2, 1986, Pages 188-196

  Kushner, Mark J ^a  

^a STI OPTRONICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; MATHEMATICAL STATISTICS - MONTE CARLO METHODS; PLASMAS - APPLICATIONS; SEMICONDUCTOR MATERIALS;

ELECTRON-IMPACT EXCITATION; RF DISCHARGES; SILANE;

ELECTRIC DISCHARGES;

EID: 0022704635     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/TPS.1986.4316522     Document Type: Article

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