Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing

Plasma Chemistry and Plasma Processing

Volumn 6, Issue 1, 1986, Pages 79-96

  Chaker, M ^a   Moisan, M ^a   Zakrzewski, Z ^a  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

atmospheric pressure; high pressure; low pressure; microwave discharges; Plasma; radial density distributions; RF; surface wave

Indexed keywords

ELECTRIC DISCHARGES; ELECTROMAGNETIC WAVES; MICROWAVES; SURFACE WAVES;

MICROWAVE DISCHARGES; RADIAL DENSITY DISTRIBUTIONS; RF DISCHARGES; SURFACE WAVE;

PLASMAS;

EID: 0022678643     PISSN: 02724324     EISSN: 15728986     Source Type: Journal    
DOI: 10.1007/BF00573823     Document Type: Article

References (36)

1. Present status of thin oxide films creation in a microwave plasma
2. Properties and applications of surface wave produced plasmas
3. Développement d'un détecteur à plasma micro-onde pour chromatographie en phase gazeuse
4. Comparison of two new microwave plasma sources for HF chemical lasers
5. 37th Gaseous Electronic Conference (1984)
6. Amorphous silicon for photovoltaics produced by new microwave plasma-deposition techniques
7. A Waveguide-Based Launcher to Sustain Long Plasma Columns through the Propagation of an Electromagnetic Surface Wave
8. Distribution radiale de la densité électronique et de la densité des atomes excités dans une colonne de plasma produite par une onde de surface