Nanosecond resolution time-resolved x-ray study of silicon during pulsed-laser irradiation

Journal of Materials Research

Volumn 1, Issue 1, 1986, Pages 144-154

  Larson, B C ^a   Tischler, J Z ^a   Mills, D M ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT - LASER APPLICATIONS; METALLOGRAPHY - RECRYSTALLIZATION; SILICON AND ALLOYS - X-RAY ANALYSIS;

CORNELL HIGH-ENERGY SYNCHROTRON SOURCE; INTERFACE PHENOMENA; LASER-RADIATION HEATING; NANOSECOND RESOLUTION; PULSED-LASER IRRADIATION;

SEMICONDUCTING SILICON;

EID: 0022598674     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1986.0144     Document Type: Article

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