Optical detection of particle contamination on surfaces: A review

Aerosol Science and Technology

Volumn 5, Issue 2, 1986, Pages 145-165

  Lilienfeld, Pedro ^a  

^a GCA Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS - OPTICAL PROPERTIES; INSPECTION; QUALITY CONTROL;

INDEX OF REFRACTION; PARTICLE CONTAMINATION; POLARIZATION EFFECTS;

SURFACES;

EID: 0022499864     PISSN: 02786826     EISSN: 15217388     Source Type: Journal    
DOI: 10.1080/02786828608959085     Document Type: Article

References (11)

1. Bennett, J. M. (1985a). Scattering and surface evaluation techniques for the optics of the future. Opt. News July; 17.
2. Bennett, J. M. (1985b). Comparison of techniques for measuring the roughness of optical surfaces. Opt. Eng. 24:380.
3. Bennett, J. M., and Detrio, J. A. (1984). Standard test method for measuring the effective surface roughness of optical components by total integrated scattering. ASTM Doc. 2A44, Draft 5.
4. Chase, E. T., Broude, S. V., and Quakenbos, G. S. (1984). Surface inspection apparatus. U. S. Serial No. 682794 patent pending, filed 18 December 1984.
5. Church, E. L., and Zavado, J. M. (1975). Residual surface roughness of diamond formed optics. Appl. Opt. 14:1788.
6. Kerker, M. (1969). The Scattering of Light and Other Electromagnetic Radiation. Academic, New York.
7. Lilienfeld, P. (1986). Applications of pellicles in clean air surface technology. In Treatise on Clean Surface Technology (K. L. Mittal, Ed.). To be published by Plenum, New York.
8. Mie, G. (1908). Beiträge zur Optic trüber Medien Speziell Kolloidaler Metallösungen. Ann. Phys. (Leipzig) 25(3):376.
9. Shiba, M., Koizumi, M., and Katsuta, T. (1984). Automatic inspection of contaminants on reticles. Proceedings of SPIE on Optical Microlithography III 470, pp. 233–239.
10. Tanimoto, A., and Imamura, K. (1984). Reticle contamination monitor for a wafer stepper. Proceedings of SPIE on optical microlithography III 470, pp. 242–249.
11. Young, R. P. (1976). Low-scatter mirror degradation by particle contamination. Opt. Eng. 15:516.