NEW PROCESS FOR ONE MICRON AND FINER CMOS.

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1985, Pages 403-406

  Martin, Russel A ^a   Lewis, Alan G ^a   Huang, Tiao Y ^a   Chen, John Y ^a  

^a PALO ALTO RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES, MOS;

CMOS INTEGRATED CIRCUITS; CMOSFET; ONE MICRON;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0022288605     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)