E-beam evaporated multilayer soft x-ray coatings, analyzed with cu-k radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 563, Issue , 1985, Pages 182-194

  Bruijn, M P ^a   Chakraborty, P ^a   Van Essen, H ^a   Verhoeven, J ^a   Van Der Wiel, M J ^a   Bartels, W J ^b  

^a FOM INSTITUTE AMOLF   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; ELECTRON BEAMS - APPLICATIONS; SPUTTERING; COATINGS; DEPOSITION; FILM PREPARATION; X RAY OPTICS; X RAYS;

ELECTRON BEAM EVAPORATION; MULTILAYERS; RANDOM THICKNESS ERRORS; SOFT X-RAY COATINGS; SOFT X-RAY REFLECTIVITY;

X-RAY FILMS; MULTILAYERS;

E-BEAMS; K-ALPHA RADIATION; MULTI-LAYER-COATING; NON IDEALS; SOFT X-RAY;

EID: 0022241237     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.949667     Document Type: Conference Paper

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