Image formation in multilayers optics: The schwartzschiid objective

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 563, Issue , 1985, Pages 174-181

  Lai, B ^a   Cerrina, F ^a   Under Wood, J H ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

X-RAY FILMS; FILM PREPARATION; MULTILAYERS; X RAYS;

IMAGE FORMATION; LAYERED SYNTHETIC MICROSTRUCTURES (LSM); MULTILAYERS OPTICS; OPTICAL PATH LENGTH (OPL); RAY TRACING; SCHWARTZSCHILD OBJECTIVE (SO);

X-RAYS; X RAY OPTICS;

CRITICAL ANGLES; HIGH REFLECTIVITY; INCIDENCE ANGLES; SILICON SUBSTRATES; SOFT X-RAY REGIONS; TOTAL EXTERNAL REFLECTION;

EID: 0022217086     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.949666     Document Type: Conference Paper

References (7)

1. J.Under wood, T.W. Barbee, D.L. Shealy, SPIE 316, 79 (1981)
2. E.Spiller, A.Segmuller, J.Rife, R.P.Haelbich, Appl. Phys. Lett. 31_, 1048 (1980)
3. J.H. Underwood, T.W. Barbee, Nature 294, 429(1981)
4. I. Lovas, W. Santy, E. Spiller, R. Tibbetts, J. Wylczynski, SPIE 316, 90 (1981)
5. F. Cerrina, SPIE 503, 68(1984)
6. M. Born and E. Wolff, “Principle of Optics”, Pergamon 1980
7. J.H. Underwood, T.W. Barbee, Appl. Optics 2Q, 3027, (1981)