TEM observation of microstructure in sputtered co-cr film

Japanese Journal of Applied Physics

Volumn 24, Issue 12, 1985, Pages L951-L953

  Maeda, Yasushi ^a   Hirono, Shigeru ^a   Asahi, Masayoshi ^a  

^a NTT Electrical Communications Laboratories ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METALLOGRAPHY - MICROSTRUCTURES; MICROSCOPES, ELECTRON - APPLICATIONS; SPUTTERING;

HYDRAZINE MONOHYDRATE; ION BEAM MILLING; MICROSTRUCTURE;

COBALT CHROMIUM ALLOYS;

EID: 0022209077     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.24.L951     Document Type: Article

References (6)

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3. 3) K. Ouchi and S. Iwasaki: IEEE Trans. Magn. MAG-18 (1982) 1110.
4. 4) R. Sugita: Trans. IECE Japan, 66 (1983) 55. (in Japanese).
5. 5) J. W. Smits, S. B. Luitjens and F. J. A. den Broader: J. Appl. Phys. 55 (1984) 2260.
6. 6) S. Iwasaki, K. Ouchi and T. Hizawa: J. Mag. Soc. Jpn, 9 (1985) 57. (in Japanese).