DEEP ETCHING OF SILICON USING PLASMA.

Studies in Electrical and Electronic Engineering

Volumn 20, Issue , 1985, Pages 159-164

  Fung, C D ^a   Linkowski, J R ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

PLASMAS; SENSORS - FABRICATION;

DEEP ETCHING; DRY ETCHING; ETCH RATES; MICROFABRICATION; NEGATIVE DC BIAS; WET CHEMICAL ETCHING;

SEMICONDUCTING SILICON;

EID: 0022209001     PISSN: 0167403X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)